Yuwei Semiconductor: China’s first mask pattern defect inspection equipment fully covering 90–28nm nodes shipped to a leading domestic wafer fab - IT之家

Yuwei Semiconductor has launched and begun shipping its new Raptor-600 mask pattern defect inspection tool to a leading domestic wafer fab.

The company says Raptor-600 covers process nodes from 90nm to 28nm and is designed for both mask shops and fab environments.

It aims to improve defect detection, localization, and inspection speed for photomask production and wafer manufacturing.

The move gives Chinese chipmakers a homegrown mask inspection option, helping protect yield and reduce reliance on imported tools for mature nodes.