Imec builds world's first High-NA EUV-fabricated quantum dot qubit device — breakthrough could bring quantum computing onto the same manufacturing roadmap as next-gen AI processors, compressing timelines

Imec announced the first quantum dot qubit device fabricated with High-NA EUV lithography.

The device used roughly 6 nm gate gaps in silicon spin-qubit structures.

The demo points to quantum hardware being made with advanced semiconductor manufacturing tools, not only custom labs.

That could improve reproducibility, scalability, and the path to commercial quantum chips.