Zeiss expands German site that caps ASML's EUV scanner output — first new building opens four years after Oberkochen site groundbreaking

Zeiss Semiconductor Manufacturing Technology is adding about 25,000 square meters of production space at its Oberkochen site in Germany.

The first new building is already in use, with the remaining space to come online in phases.

The expansion comes as ASML says its EUV scanner output is constrained by Zeiss capacity.

More Zeiss optics capacity could help boost ASML’s Low-NA EUV production and ease a key semiconductor lithography bottleneck.