World’s first quantum chip uses advanced lithography to make qubits easier to scale

Imec has fabricated a silicon quantum-dot qubit device using High-NA EUV lithography.

The chip includes 6 nm gaps and was made in a 300mm-compatible process.

The result shows a path toward manufacturing silicon qubits with standard semiconductor tools at scale.

If validated further, this could help remove a major hardware bottleneck for commercial quantum computers.