Huawei aims for '1.4nm-class' semiconductors by 2031, proposes a new law to replace 'Moore's Law'

Huawei unveiled a new τ scaling approach that aims to improve chip density and speed without relying only on further transistor shrinkage.

The method focuses on reducing signal delay across device, circuit, chip, and system layers, with the goal of reaching 14A, or 1.4nm-equivalent, density by 2031.

Huawei said the first practical use could appear in a Kirin chip expected in autumn 2026.

The move highlights Huawei’s effort to work around advanced-node access limits and strengthen China’s semiconductor strategy.