ASML says first silicon from its latest $400M High-NA EUV machines is just months away

ASML CEO Christophe Fouquet said the first products made with its latest High-NA EUV systems should be delivered within the next few months.

He said the roughly $400 million scanners can lower patterning costs over time and become worthwhile for major chip foundries.

Intel has been one of the most active users, while TSMC and Samsung remain more cautious about adopting the expensive tools.

The rollout marks an important step for next-generation chip manufacturing, where High-NA could boost competitiveness despite high upfront costs.