Shanghai AI Lab Achieves Breakthrough in Chip Photoresist Resin Using AI-Driven R&D Platform

Shanghai AI Lab, Xiamen University, and Suzhou Laboratory used an AI-assisted synthesis platform to develop a high-purity KrF photoresist resin for chip manufacturing.

The system automated protocol design, optimization, and execution, producing resin with low metal impurities and stable molecular distribution.

Hengkun New Materials has adapted the material, and it is now entering customer validation.

The advance could speed up semiconductor materials R&D, improve batch consistency, and reduce reliance on foreign suppliers.